LIGO Document G1300171-v1

Mechanical loss of silicon nitride films grown by plasma-enhanced chemical vapor deposition (PECVD) method

Document #:
LIGO-G1300171-v1
Document type:
G - Presentations (eg Graphics)
Other Versions:
Abstract:
Preliminary report of the mechanical loss of the silicon nitride films were given.
Topics:
Keywords:
silicon nitride films

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