Silicon-nitride Films Deposited by PECVD Method on Silicon Substrate for Next Generation Laser Interference Gravitational Wave Detector

Document #:

LIGO-G1600363-v2

Document type:

G - Presentations (eg Graphics)

Abstract:

We show optical properties and stress related mechanical loss for silicon nitride films deposited by plasma enhanced chemical vapor deposition (PECVD) method for application in the next generation laser interference gravitational wave detector.

Files in Document:

• OIC silicon nitride ppt -final-2.pdf (255.7 kB)

Topics:

• Meeting

Authors:

• Shiuh Chao
• Huang-wei Pan
• Ling-Chi Kuo
• Shu-Yu Huang

Referenced by:

• LIGO-G1601298-v1: Silicon-nitride Slides for Optical Interference Coating (OIC) Meeting, 2016

Publication Information:

For OIC OSA conference in Jun 2016