LIGO Document G1600363-v2

Silicon-nitride Films Deposited by PECVD Method on Silicon Substrate for Next Generation Laser Interference Gravitational Wave Detector

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G - Presentations (eg Graphics)
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We show optical properties and stress related mechanical loss for silicon nitride films deposited by plasma enhanced chemical vapor deposition (PECVD) method for application in the next generation laser interference gravitational wave detector.
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For OIC OSA conference in Jun 2016

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